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An Explicit Thermal Resistance Model Regarding Self-Heating Effect of AlGaN/GaN High Electron Mobility Transistor

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Alternative Title
An Explicit Thermal Resistance Model Regarding Self-Heating Effect of AlGaN/GaN High Electron Mobility Transistor
Abstract
This paper introduced an accurate empirical model for the thermal resistance of a single-finger AlGaN-GaN high electron mobility transistor (HEMT) on three different substrates including Sapphire, SiC and Si. The model reckons the constant thermal conductivity of GaN and substrate, thickness of host substrate layers, gate length (Lg) and width (Wg). The model plausibility is verified by comparing it with DC channel temperature measurement method and charge controlled based device modeling which agrees very favorable observation of the model data. Having nimble expression for the channel temperature is of inordinate importance in the field of designers of power device and monolithic microwave integrated circuits. Proposed model gives a variety of inquiries that would be impossible or impractical to do using time-consuming numerical simulations.
Author(s)
Surajit ChakrabortyJu Won ShinWalid AmirKi Yong ShinTae Woo Kim
Issued Date
2022
Type
Article
Keyword
AlGaNChannel TemperatureDevice ModelingGaNSapphireSelf-Heating EffectSi SubstrateSiCThermal Resistance(Rth)
DOI
10.4028/p-ajv0ev
URI
https://oak.ulsan.ac.kr/handle/2021.oak/13858
Publisher
Materials Science Forum
Language
영어
ISSN
0255-5476
Citation Volume
1074
Citation Start Page
125
Citation End Page
131
Appears in Collections:
Medicine > Nursing
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