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RTA 후속 열처리에 따른 ZnO/Cu/ZnO 박막의 투명전극 및 발열체 특성 연구

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Abstract
ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10-3 Ωcm to 1.18 × 10-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.
Author(s)
Effect of Rapid Thermal Annealing on the Transparent Conduction and Heater Property of ZnO/Cu/ZnO Thin Films
Issued Date
2023
이연학
김대일
Type
Article
Keyword
ZnOCuRapid thermal annealingXRDAFM
DOI
10.12656/jksht.2023.36.3.115
URI
https://oak.ulsan.ac.kr/handle/2021.oak/15928
Publisher
열처리공학회지
Language
한국어
ISSN
1225-1070
Citation Volume
36
Citation Number
3
Citation Start Page
115
Citation End Page
120
Appears in Collections:
Engineering > Material Engineering
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