RTA 후속 열처리에 따른 ZnO/Cu/ZnO 박막의 투명전극 및 발열체 특성 연구
- Alternative Title
- Effect of Rapid Thermal Annealing on the Transparent Conduction and Heater Property of ZnO/Cu/ZnO Thin Films
- Abstract
- ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10-3 Ωcm to 1.18 × 10-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.
- Author(s)
- 이연학; 김대일
- Issued Date
- 2023
- Type
- Article
- Keyword
- ZnO; Cu; Rapid thermal annealing; XRD; AFM
- DOI
- 10.12656/jksht.2023.36.3.115
- URI
- https://oak.ulsan.ac.kr/handle/2021.oak/15928
- Publisher
- 열처리공학회지
- Language
- 한국어
- ISSN
- 1225-1070
- Citation Volume
- 36
- Citation Number
- 3
- Citation Start Page
- 115
- Citation End Page
- 120
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Appears in Collections:
- Engineering > Material Engineering
- 공개 및 라이선스
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