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RTA 후속 열처리에 따른 ZnO/Cu/ZnO 박막의 투명전극 및 발열체 특성 연구

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Alternative Title
Effect of Rapid Thermal Annealing on the Transparent Conduction and Heater Property of ZnO/Cu/ZnO Thin Films
Abstract
ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10-3 Ωcm to 1.18 × 10-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.
Author(s)
이연학김대일
Issued Date
2023
Type
Article
Keyword
ZnOCuRapid thermal annealingXRDAFM
DOI
10.12656/jksht.2023.36.3.115
URI
https://oak.ulsan.ac.kr/handle/2021.oak/15928
Publisher
열처리공학회지
Language
한국어
ISSN
1225-1070
Citation Volume
36
Citation Number
3
Citation Start Page
115
Citation End Page
120
Appears in Collections:
Engineering > Material Engineering
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