전자빔 조사 에너지에 따른 TIO/Ag/TIO 박막의 전기적, 광학적 특성 변화

Abstract

The influence of electron irradiation energy on the optical and electrical properties of TIO/Ag/TIO films has been investigated. These films prepared with RF and DC magnetron sputtering; they show the lowest resistivity of 4.71 × 10?? Ωcm. The visible transmittance also increased with the electron irradiation energy. The film irradiated at 700 eV shows 83.71% of visible transmittance. In addition, the electron irradiated films at 700 eV show a lower RMS roughness of 63.54 nm. Comparing the figure of merit, we conclude that the visible transmittance and electrical resistivity of the films are dependent on the electron irradiation energy; moreover, the opto-electrical performance of the film is enhanced by electron irradiation.