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Influence of Ag interlayer Thickness on the Optical, Electrical and Mechanical Properties of Ti-doped In2O3/Ag/Ti-doped In2O3 Multilayer Flexible Transparent Conductive Electrode

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Abstract
Transparent and conductive Ti-doped In2O3 (TIO)/Ag/Ti-doped In2O3 (TAT) multilayer films were deposited on colorless poly imide (CPI) substrates by direct current (DC) and radio frequency (RF) magnetron sputtering at room temperature. During deposition the thickness of both the top and bottom TIO layer was fixed at 30 nm, while the thickness of the Ag interlayer was varied, to 5, 10, and 15 nm, to enhance the optical, electrical and mechanical properties of the films. In the XRD analysis the TIO films did not show any characteristic peaks in the diffraction pattern. The 10 nm thick Ag inter layer showed some characteristic peaks of Ag (111), (200), (220) and (311), respectively, and the grain size of the Ag interlayer enlarged as Ag thickness increased. To investigate the most efficient Ag interlayer thickness, a figure of merit (FOM) based on the opto-electrical performance of the transparent conducting films was compared. The films with a 10 nm thick Ag interlayer exhibited a higher FOM of 1.71 x 10(-2) O-1 than the other films. When the radius of the film's curvature was reduced to 1.7 mm, the TIO single layer films showed a 13 times increase in sheet resistance, while the TAT (30/10/30 nm) films showed an insignificant change in sheet resistance. From the observed results, it was concluded that the Ag interlayer in the TAT multilayer films enhanced the opto-electrical performance of the films and also acted as a potent bridge which assured the high flexibility endurance of the films.
Author(s)
최수현장진규김현진최재욱허성보김유성공영민김대일
Issued Date
2021
Type
Article
Keyword
TIOAgX-ray diffractionfigure of meritflexible endurance
DOI
10.3365/KJMM.2021.59.8.545
URI
https://oak.ulsan.ac.kr/handle/2021.oak/9002
https://ulsan-primo.hosted.exlibrisgroup.com/primo-explore/fulldisplay?docid=TN_cdi_crossref_primary_10_3365_KJMM_2021_59_8_545&context=PC&vid=ULSAN&lang=ko_KR&search_scope=default_scope&adaptor=primo_central_multiple_fe&tab=default_tab&query=any,contains,Influence%20of%20Ag%20interlayer%20Thickness%20on%20the%20Optical,%20Electrical%20and%20Mechanical%20Properties%20of%20Ti-doped%20In2O3%2FAg%2FTi-doped%20In2O3%20Multilayer%20Flexible%20Transparent%20Conductive%20Electrode&offset=0&pcAvailability=true
Publisher
KOREAN JOURNAL OF METALS AND MATERIALS
Location
대한민국
Language
한국어
ISSN
1738-8228
Citation Volume
59
Citation Number
8
Citation Start Page
545
Citation End Page
550
Appears in Collections:
Engineering > Material Engineering
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