Selective Growth and Robust Valley Polarization of Bilayer 3R-MoS2
- Abstract
- It turns out that as-grown bilayers are predominantly 3R-type, not more common 2H-type, as verified by microscopic and spectroscopic characterizations. As expected, 3R bilayer showed a significantly higher valley polarization compared with centrosymmetric 2H bilayer, which undergoes efficient interlayer scattering across contrasting valleys because of their vertical alignment of the K and K^' points in momentum space. Interestingly, 3R bilayer showed even higher valley polarization compared with the monolayer counterpart. Moreover, 3R bilayer reasonably maintained its valley efficiency over a very wide range of excitation power density from ~0.16 kW/cm2 to ~0.16 MW/cm2 at both low and room temperatures. These observations are rather surprising, because valley dephasing could be more efficient in the bilayer via both interlayer and intralayer scatterings, whereas only intralayer scattering is allowed in monolayer. The improved valley polarization of 3R bilayer can be attributed to its indirect-gap nature, where valley-polarized excitons can relax into the valley-insensitive band edge, which otherwise scatter into the contrasting valley to effectively cancel out the initial valley polarization. Our results provide a facile route for the growth of 3R-MoS2 bilayers that could be utilized as a platform for advancing valleytronics
- Author(s)
- Farman Ullah; Je-Ho Lee; 타히르 지샨; Abdus Samad; 레 친 탐; Jungcheol Kim; Donggyu Kim; 라시드 마문 우르; Sol Lee; 김관표; 정현식; 장준익; 성맹제; 김용수
- Issued Date
- 2021
- Type
- Article
- Keyword
- chemical vapor deposition; transition metal dichalcogenides; valleytronics; 3R-MoS2; intervalley scattering
- DOI
- 10.1021/acsami.1c16889
- URI
- https://oak.ulsan.ac.kr/handle/2021.oak/9543
https://ulsan-primo.hosted.exlibrisgroup.com/primo-explore/fulldisplay?docid=TN_cdi_proquest_miscellaneous_2600287482&context=PC&vid=ULSAN&lang=ko_KR&search_scope=default_scope&adaptor=primo_central_multiple_fe&tab=default_tab&query=any,contains,Selective%20Growth%20and%20Robust%20Valley%20Polarization%20of%20Bilayer%203R-MoS2&offset=0&pcAvailability=true
- Publisher
- ACS Applied Materials & Interfaces
- Location
- 미국
- Language
- 영어
- ISSN
- 1944-8244
- Citation Volume
- 13
- Citation Number
- 48
- Citation Start Page
- 57588
- Citation End Page
- 57596
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Appears in Collections:
- Natural Science > Physics
- 공개 및 라이선스
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