KLI

스퍼터링후 질화에 의한 Cr 질화물 박막제조에 관한 연구

Metadata Downloads
Alternative Title
A Study on the Synthesis of Cr Nitride Layer by Sputtering and Gas Nitriding
Abstract
SKD11강에 반응성 스퍼터링으로 Cr 질화물 박막을 제조하고, 또 다른 방법으로 SKD11강에 스퍼터링으로 Cr 을 증착한 후 개스질화를 하여 Cr질화물 박막을 제조하고 이 두가지 방법으로 얻은 Cr질화물 층의 조성, 경도, 밀착력을 비교하여본 결과 Cr 증착 후 개스질화한 방법이 보다 우수한 물성을 갖는 Cr질화물 층을 얻을수 있었다.
Cr nitride layer was obtained on SKD11 steel specimens by reactive sputtering. Also, Cr nitride layer on SKD11 steel was synthesized by sputtering of Cr and subsequent gas nitriding. Cr nitride layers obtained by these two methods were compared in terms of composition, micro-hardness, and adhesion strength. Cr nitride layer formed by sputtering and gas nitriding had better mechanical properties than those obtained by reactive sputtering.
Cr nitride layer was obtained on SKD11 steel specimens by reactive sputtering. Also, Cr nitride layer on SKD11 steel was synthesized by sputtering of Cr and subsequent gas nitriding. Cr nitride layers obtained by these two methods were compared in terms of composition, micro-hardness, and adhesion strength. Cr nitride layer formed by sputtering and gas nitriding had better mechanical properties than those obtained by reactive sputtering.
Author(s)
김선규
Issued Date
1999
Type
Research Laboratory
URI
https://oak.ulsan.ac.kr/handle/2021.oak/3847
http://ulsan.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000002024364
Alternative Author(s)
Kim, Sun Kyu
Publisher
공학연구논문집
Language
kor
Rights
울산대학교 저작물은 저작권에 의해 보호받습니다.
Citation Volume
30
Citation Number
1
Citation Start Page
423
Citation End Page
430
Appears in Collections:
Research Laboratory > Engineering Research
Authorize & License
  • Authorize공개
Files in This Item:

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.